Date of Award
1-1-2013
Language
English
Document Type
Dissertation
Degree Name
Doctor of Philosophy (PhD)
College/School/Department
Department of Nanoscale Science and Engineering
Program
Nanoscale Engineering
Content Description
1 online resource (x, 128 pages) : illustrations (some color)
Dissertation/Thesis Chair
Bradley L Thiel
Committee Members
Alain Diebold, Mengbing Huang, Eric Lifshin, Bryan Rice
Keywords
metrology, SEM, Scanning electron microscopes, Particles (Nuclear physics), Metrology
Subject Categories
Nanoscience and Nanotechnology
Abstract
Critical dimension scanning electron microscopes (CD-SEMs) are used to perform highly accurate dimensional metrology on patterned features. In order to ensure optimal feedback for process control, it is necessary that these tools produce highly reproducible measurements. As the smallest device features continue to shrink, and new challenging high aspect ratio (HAR) structures are being introduced, gaps are appearing between process control measurements that are necessary for high volume manufacturing and the capabilities of the CD-SEM. Two possible routes for solving this problem include improvement of the existing CD-SEM technology or the replacement of the CD-SEM.
Recommended Citation
Cepler, Aron Joel, "Charged particle imaging methods for CD metrology of sub 22nm 3D device structures" (2013). Legacy Theses & Dissertations (2009 - 2024). 850.
https://scholarsarchive.library.albany.edu/legacy-etd/850