Date of Award

1-1-2012

Language

English

Document Type

Dissertation

Degree Name

Doctor of Philosophy (PhD)

College/School/Department

Department of Nanoscale Science and Engineering

Program

Nanoscale Sciences

Content Description

1 online resource (xviii, 174 pages) : illustrations (some color)

Dissertation/Thesis Chair

Robert E Geer

Committee Members

Ji Ung Lee, Vincent LaBella, Carl Ventrice Jr., Spyros Gallis

Keywords

doping profile, electrostatic doping, Fermi level shift, graphene p-n junction, Kelvin probe force microscopy, surface potential, Semiconductors, Graphene, Surface discharges (Electricity)

Subject Categories

Materials Science and Engineering

Abstract

Manipulation and control of electron current in a graphene p-n junction (e.g. electron waveguiding, reflection, focusing) is directly determined by the spatial gradient of the Fermi level across the junction. Sharp Fermi level gradients are associated with negative index `lensing' of electrons in graphene while broader gradients are predicted to form reflective boundaries. Quantitative metrology of the Fermi level gradient at p-n junctions is thus essential to determine device performance, validate models for device design and switch architectures, and quantitatively determine the impact of defects on device function and leakage.

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