Date of Award

1-1-2012

Language

English

Document Type

Master's Thesis

Degree Name

Master of Science (MS)

College/School/Department

Department of Nanoscale Science and Engineering

Program

Nanoscale Sciences

Content Description

1 online resource (44 pages) : illustrations (some color)

Dissertation/Thesis Chair

Magnus Bergkvist

Keywords

MVD, Silanes, Vapor-plating, Organosilicon compounds, Siloxanes

Subject Categories

Nanoscience and Nanotechnology

Abstract

Current strategies for low temperature bonding (<300 C) and 3D integration employ polymer interfaces (1-3 um) with low thermal conductivity which can result in poor heat transfer between bonded elements. The introduction of thinner interfaces to improve heat transfer is desirable; however, deposition of thin polymer films (<100 nm) for bonding applications can lead to reduced film uniformity and negatively affect bonding strength. Self-assembled monolayer (SAM) chemistries provide a potential solution and can yield nanometer control of the interfacial layer thickness without a significant effect on surface roughness. Siloxanes are one available option to realize these nanometer thin reactive layers. Due to their propensity to crosslink and form multilayers, careful control of the reaction conditions is required. Considering this, we have evaluated the molecular vapor deposition of siloxane precursors to generate molecular layers with reactive end-groups for potential use in bonding applications. Film stability, morphology, thickness, and composition were monitored after deposition using atomic force microscopy, ellipsometry and x-ray photoelectron spectroscopy.

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