Date of Award

1-1-2011

Language

English

Document Type

Dissertation

Degree Name

Doctor of Philosophy (PhD)

College/School/Department

Department of Nanoscale Science and Engineering

Program

Nanoscale Sciences

Content Description

1 online resource (xvii, 156 pages) : PDF file, illustrations (some color)

Dissertation/Thesis Chair

Gregory Denbeaux

Committee Members

John Hartley, Richard Matyi, Fatemeh (Shadi) Shahedipour-Sandvik, Chiew-seng Koay

Keywords

EUV, extreme ultraviolet, lithography, mask, mask contamination, optics contamination, Extreme ultraviolet lithography, Masks (Electronics), Integrated circuits, Electronic apparatus and appliances

Subject Categories

Materials Science and Engineering | Nanoscience and Nanotechnology

Abstract

This dissertation investigates one of the remaining issues for extreme ultraviolet (EUV) lithography, the effects of radiation induced carbon contamination on the printing performance of patterned EUV masks. The impact of carbon contamination on EUV masks is significant due to the throughput loss and potential effects on imaging performance, and occurs when multilayer surfaces are exposed to EUV radiation with residual carbonaceous species present. Current carbon contamination research is primarily focused on the lifetime of the multilayer surfaces, determined by reflectivity loss and reduced throughput in EUV exposure tools. However, contamination on patterned EUV masks can cause additional effects on absorbing features and affect the printed images.

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