Date of Award
1-1-2018
Language
English
Document Type
Dissertation
Degree Name
Doctor of Philosophy (PhD)
College/School/Department
Department of Nanoscale Science and Engineering
Program
Nanoscale Sciences
Content Description
1 online resource (xii, 106 pages) : color illustrations.
Dissertation/Thesis Chair
Nathaniel C Cady
Committee Members
Alain C Diebold, Hassaram Bakhru, James R Lloyd, Joseph E Van Nostrand
Keywords
Displacement damage, Ionization damage, Oxygen vacancies, Radiation effects, Resistive memory (RRAM), Tantalum oxide, Metal oxide semiconductors, Nonvolatile random-access memory, Tantalum oxides, Radiation hardening
Subject Categories
Aerospace Engineering | Electrical and Electronics | Nuclear
Abstract
There is an increasing need for radiation-hardened electronics as space programs grow in number and scope. Scientific interest in long-term exploration, particularly in high-radiation environments such as Europa, as well as commercial interest in establishing permanent outposts, requires high tolerance of radiation effects. A flash memory device might survive for several years in low Earth orbit, but only a few days in orbit around Europa due to the extremely high levels of radiation encountered there. Meanwhile, commercial interests, including asteroid mining and building a base on the moon or Mars would require electronic systems that could survive for long periods of time, or indefinitely, in each location. Flash memories are suitable for multi-year operation in low Earth orbit due to shielding of cosmic rays by Earth’s magnetic field. However, long-term missions beyond low Earth orbit have higher radiation requirements, which may not be suitable for even rad-hardened flash memories.
Recommended Citation
Holt, Joshua Stuart, "Radiation effects in tantalum oxide-based resistive memory devices" (2018). Legacy Theses & Dissertations (2009 - 2024). 2072.
https://scholarsarchive.library.albany.edu/legacy-etd/2072