Date of Award

1-1-2013

Language

English

Document Type

Dissertation

Degree Name

Doctor of Philosophy (PhD)

College/School/Department

Department of Nanoscale Science and Engineering

Program

Nanoscale Engineering

Content Description

1 online resource (x, 128 pages) : illustrations (some color)

Dissertation/Thesis Chair

Bradley L Thiel

Committee Members

Alain Diebold, Mengbing Huang, Eric Lifshin, Bryan Rice

Keywords

metrology, SEM, Scanning electron microscopes, Particles (Nuclear physics), Metrology

Subject Categories

Nanoscience and Nanotechnology

Abstract

Critical dimension scanning electron microscopes (CD-SEMs) are used to perform highly accurate dimensional metrology on patterned features. In order to ensure optimal feedback for process control, it is necessary that these tools produce highly reproducible measurements. As the smallest device features continue to shrink, and new challenging high aspect ratio (HAR) structures are being introduced, gaps are appearing between process control measurements that are necessary for high volume manufacturing and the capabilities of the CD-SEM. Two possible routes for solving this problem include improvement of the existing CD-SEM technology or the replacement of the CD-SEM.

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