Date of Award

1-1-2013

Language

English

Document Type

Dissertation

Degree Name

Doctor of Philosophy (PhD)

College/School/Department

Department of Nanoscale Science and Engineering

Program

Nanoscale Engineering

Content Description

1 online resource (xviii, 148 pages) : illustrations (some color)

Dissertation/Thesis Chair

John G Hartley

Committee Members

Bradley Thiel, Eric Lifshin, Gregory Denbeaux, Abraham Arceo

Keywords

electron beam lithography, point spread function, resolution limit, secondary electrons, Lithography, Electron beam

Subject Categories

Materials Science and Engineering | Nanoscience and Nanotechnology

Abstract

Electron beam lithography is one of the most important tools for nanofabrication. Electron beam lithography has consistently been able to offer higher resolution, typically better than 10 nm or so, compared to other techniques. In this work the contribution of electron-substrate interaction to pattern resolution is investigated.

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