Date of Award

1-1-2013

Language

English

Document Type

Dissertation

Degree Name

Doctor of Philosophy (PhD)

College/School/Department

Department of Nanoscale Science and Engineering

Program

Nanoscale Sciences

Content Description

1 online resource (ix, 205 pages) : illustrations (some color)

Dissertation/Thesis Chair

Robert L Brainard

Committee Members

Magnus Bergkvist, Daniel Freedman, John T Welch, Gregory Denbeaux

Keywords

Chain-Scission, EUV, Lithography, MORE, Photoresist, Resist, Extreme ultraviolet lithography, Photoresists, Hafnium compounds, Scission (Chemistry), Organometallic compounds, Ligands

Subject Categories

Chemistry | Nanoscience and Nanotechnology

Abstract

Extreme Ultraviolet (EUV) lithography is currently the best option for replacing 193-nm lithography in future IC fabrication. For EUV to be successful, however, there are a number of challenges that must be overcome. Current resist designs struggle to meet the demands of future lithography nodes. We propose the best way to overcome these obstacles is through the design of novel resist systems.

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