Date of Award
1-1-2012
Language
English
Document Type
Dissertation
Degree Name
Doctor of Philosophy (PhD)
College/School/Department
Department of Nanoscale Science and Engineering
Program
Nanoscale Engineering
Content Description
1 online resource (xvi, 238 pages) : illustrations (some color)
Dissertation/Thesis Chair
John G Hartley
Committee Members
Timothy R Groves, Robert L Brainard, Kathleen A Dunn, Radislav A Potyrailo
Keywords
Electron Beam Lihography, Hansen Solubility Parameters, Nanostructures, Photonics, Resist, Lithography, Electron beam
Subject Categories
Materials Science and Engineering | Nanoscience and Nanotechnology | Polymer Chemistry
Abstract
Three dimensional micro- and nano-structures are commonly used in the field of Photonics, Optoelectronics, Sensors and Biological applications. Although numerous physical models are developed, a major challenge has been in their fabrication which is commonly limited to conventional layer-by-layer techniques. In this dissertation, a novel method for fabricating three dimensional structures using Electron Beam Lithography (EBL) will be presented.
Recommended Citation
Bonam, Ravi Kiran, "A novel fabrication technique for three-dimensional nanostructures" (2012). Legacy Theses & Dissertations (2009 - 2024). 508.
https://scholarsarchive.library.albany.edu/legacy-etd/508
Included in
Materials Science and Engineering Commons, Nanoscience and Nanotechnology Commons, Polymer Chemistry Commons