Date of Award

1-1-2011

Language

English

Document Type

Dissertation

Degree Name

Doctor of Philosophy (PhD)

College/School/Department

Department of Nanoscale Science and Engineering

Program

Nanoscale Sciences

Content Description

1 online resource (x, 217 pages) : illustrations (some color)

Dissertation/Thesis Chair

Robert L Brainard

Committee Members

Gregory Denbeaux, Magnus Bergkvist, Michael Carpenter, Todd Younkin

Keywords

Acid Amplifier, EUV, Lithography, Photoresist, Extreme ultraviolet lithography, Photoresists, Fluorination

Subject Categories

Nanoscience and Nanotechnology

Abstract

Extreme ultraviolet lithography (EUV) is a promising candidate for next generation lithography. Although EUV has great potential there are still many challenges that must be solved before the technology can be implemented in the high volume manufacturing of semiconductor devices. The lithographic performance of EUV photoresists is one aspect that requires improvement. Particularly, EUV resists need simultaneous improvements in three properties: resolution, line-edge-roughness and sensitivity. The incorporation of acid amplifiers (AAs) in resists is one method to improve all three properties.

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