Date of Award

1-1-2011

Language

English

Document Type

Dissertation

Degree Name

Doctor of Philosophy (PhD)

College/School/Department

Department of Nanoscale Science and Engineering

Program

Nanoscale Sciences

Content Description

1 online resource (xi, 141 pages) : illustrations (some color)

Dissertation/Thesis Chair

Kathleen Dunn

Committee Members

Robert Brainard, John Hartley, John Elter, Milos Toth

Keywords

Cryogenic, Deposition, EBID, Electron, Platinum, SEM, Nanoelectronics, Cryoelectronics, Nanostructured materials, Electron microscopy

Subject Categories

Nanoscience and Nanotechnology

Abstract

A modified version of electron beam-induced-deposition (EBID) has been studied, where cryogenic substrates were employed to alter the growth environment. Cryogenic substrates enabled multi-layer condensed phase films, which, upon electron exposure and reheating to room temperature, exhibited several unique surface morphologies not present in traditional EBID deposits. By analyzing the composition and structure of the cryogenic deposits, along with simulation of energy deposition from exposure, a diffusion based growth mechanism has been proposed. To test the validity of the proposed model, several process variables were investigated including electron flux, electron fluence, condensate thickness and precursor type. Using the knowledge garnered through testing of process variables, a large volume 3D deposition process was developed, along with a method to deposit multiple materials within a single exposure. The development of these advanced deposition methods, and analysis of the structures produced, were consistent with the proposed diffusion based growth model. The results contained in this work illustrate that cryogenically enhanced EBID can be used to increase the utility of traditional EBID, for potential applications in catalysis, biosystems, and in-situ device fabrication.

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