Date of Award

1-1-2018

Language

English

Document Type

Dissertation

Degree Name

Doctor of Philosophy (PhD)

College/School/Department

Department of Physics

Content Description

1 online resource (ii, ix, 55 pages) : illustrations (some color)

Dissertation/Thesis Chair

T. S. Kuan

Committee Members

J. A. Ernst, J. C. Kimball, W. A. Lanford, G.-C. Wang

Keywords

Interface, Localization, Scattering, Superlattice, Thin films, Superlattices as materials, Quantum scattering, Electric conductivity, Electron transport, Thin films, Multilayered, Copper alloys

Subject Categories

Physics

Abstract

Ultra-thin films and multilayer structures are widely used in modern technologies such as semiconductor logic and memory devices. As film thickness decreases to a few nanometers or smaller, classical transport theories are no longer valid. In this study, we investigate transport properties of superlattices with layer thickness reduced to ~1 nm. The superlattices are made of alternating layers of Cu and a transition metal (Ru, Mo, and Co). The layers are deposited by physical vapor deposition and resistance changes during superlattice growth are measured. The observed resistance evolution reveals the effects of carrier scattering and localization at the interfaces.

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