Date of Award
1-1-2015
Language
English
Document Type
Dissertation
Degree Name
Doctor of Philosophy (PhD)
College/School/Department
Department of Nanoscale Science and Engineering
Program
Nanoscale Sciences
Content Description
1 online resource (xx, 140 pages) : color illustrations.
Dissertation/Thesis Chair
Dr. Alain C. Diebold
Committee Members
Dr. Richard Farrell, Dr. Hassaram Bakhru, Dr. Carl Ventrice, Dr. Ernest Levine
Keywords
Directed self-assembly (DSA), Ellipsometry, Metrology, Mueller matrix, OCD, Scatterometry, Light, Optical measurements, Semiconductors, Nanostructured materials
Subject Categories
Materials Science and Engineering | Optics
Abstract
The semiconductor industry continues to drive patterning solutions that enable devices with higher memory storage capacity, faster computing performance, lower cost per transistors, and higher transistor density. These developments in the field of semiconductor manufacturing along with the overall minimization of the size of transistors require cutting-edge metrology tools for characterization.
Recommended Citation
Dixit, Dhairya J., "Optical metrology for directed self-assembly patterning using Mueller matrix spectroscopic ellipsometry based scatterometry" (2015). Legacy Theses & Dissertations (2009 - 2024). 1374.
https://scholarsarchive.library.albany.edu/legacy-etd/1374