Date of Award

1-1-2015

Language

English

Document Type

Master's Thesis

Degree Name

Master of Science (MS)

College/School/Department

Department of Nanoscale Science and Engineering

Program

Nanoscale Engineering

Content Description

1 online resource (v, 76 pages) : illustrations (some color)

Dissertation/Thesis Chair

Robert Brainard

Committee Members

Kathleen Dunn, Daniel Freedman, Scott Tenenbaum, Bradley Thiel

Keywords

Extreme Ultraviolet, Line-edge Roughness, Organometallic, Photoresist, Photoresists, Photolithography, Extreme ultraviolet lithography, Nanostructured materials, Organotin compounds, Organotellurium compounds

Subject Categories

Nanoscience and Nanotechnology

Abstract

EUV photoresists made from organotin and organotellurium dicarboxylates were lithographically evaluated for photosensitivity and dense-line patterning. The effects of ligand structure and central metal are explored through systematic molecular modification. Through this work, two photoresists were discovered that are capable of high resolution and low line-edge roughness. Dibenzyltin dipivalate resolves 22-nm dense lines with 1.4-nm LER and dibenzyltin dibenzoate resolves 35-nm dense lines with 1.1-nm LER.

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