Date of Award
1-1-2015
Language
English
Document Type
Dissertation
Degree Name
Doctor of Philosophy (PhD)
College/School/Department
Department of Nanoscale Science and Engineering
Program
Nanoscale Sciences
Content Description
1 online resource (xxxiii, 300 pages) : color illustrations.
Dissertation/Thesis Chair
Magnus Bergkvist
Committee Members
Bradley Thiel, Robert Brainard, Yubing Xie, Bruce Altemus
Keywords
Adhesion Energy, Epoxy Curing Chemistry, Initiated Chemical Vapor Deposition, Polymer Thin Films, Solventless Adhesives, Wafer Bonding, Vapor-plating, Thin films, Peroxides, Polymers
Subject Categories
Materials Science and Engineering | Nanoscience and Nanotechnology | Polymer Chemistry
Abstract
Opportunities and challenges for chemical vapor deposition (CVD) of polymer thin films stems from their applications in electronics, sensors, and adhesives with demands for control over film composition, conformity and stability. Initiated chemical vapor deposition (iCVD) is a subset of the CVD technique that conjoins bulk free-radical polymerization chemistry with gas-phase processing. The novelty of iCVD technique stems from the use of an initiator that can be activated at low energies (150 – 300 °C) to react with surface adsorbed monomer to form a polymer film. This reduces risk for potential unwarranted side-reactions.
Recommended Citation
Bharamaiah Jeevendrakumar, Vijay Jain, "Initiated chemical vapor deposition (iCVD) polymer thin films : structure-property effects on thermal degradation and adhesion" (2015). Legacy Theses & Dissertations (2009 - 2024). 1338.
https://scholarsarchive.library.albany.edu/legacy-etd/1338
Included in
Materials Science and Engineering Commons, Nanoscience and Nanotechnology Commons, Polymer Chemistry Commons