Date of Award

1-1-2015

Language

English

Document Type

Dissertation

Degree Name

Doctor of Philosophy (PhD)

College/School/Department

Department of Nanoscale Science and Engineering

Program

Nanoscale Sciences

Content Description

1 online resource (xxxiii, 300 pages) : color illustrations.

Dissertation/Thesis Chair

Magnus Bergkvist

Committee Members

Bradley Thiel, Robert Brainard, Yubing Xie, Bruce Altemus

Keywords

Adhesion Energy, Epoxy Curing Chemistry, Initiated Chemical Vapor Deposition, Polymer Thin Films, Solventless Adhesives, Wafer Bonding, Vapor-plating, Thin films, Peroxides, Polymers

Subject Categories

Materials Science and Engineering | Nanoscience and Nanotechnology | Polymer Chemistry

Abstract

Opportunities and challenges for chemical vapor deposition (CVD) of polymer thin films stems from their applications in electronics, sensors, and adhesives with demands for control over film composition, conformity and stability. Initiated chemical vapor deposition (iCVD) is a subset of the CVD technique that conjoins bulk free-radical polymerization chemistry with gas-phase processing. The novelty of iCVD technique stems from the use of an initiator that can be activated at low energies (150 – 300 °C) to react with surface adsorbed monomer to form a polymer film. This reduces risk for potential unwarranted side-reactions.

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