Date of Award

1-1-2014

Language

English

Document Type

Master's Thesis

Degree Name

Master of Science (MS)

College/School/Department

Department of Nanoscale Science and Engineering

Program

Nanoscale Engineering

Content Description

1 online resource (xiii, 114 pages) : color illustrations.

Dissertation/Thesis Chair

Gregory Denbeaux

Committee Members

Carl Ventrice, Laura Schultz, Richard Matyi, Fred Strnisa

Keywords

EUV, extreme ultraviolet, lithography, Out-of-Band, photolithography, photoresists, Extreme ultraviolet lithography, Photoresists, Integrated circuits

Subject Categories

Engineering | Nanoscience and Nanotechnology

Abstract

As extreme ultraviolet lithography (EUVL) prepares to be incorporated into high volume manufacturing, many challenges must be addressed. Among these challenges, a need for photoresist improvement exists. The work described here will look into some of the problems and challenges facing EUV resists, in particular out-of-band (OOB) wavelengths of light and their interaction with photoresists. Studies have been completed on the effect of out-of-band light on photoresists [1]-[3]. It is imperative that solutions to suppress the deep ultraviolet (DUV) OOB light be incorporated into next generation EUV production tools due to concerns of decreased performance of lithography, and an increase of outgassing contamination [2].

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