Date of Award

1-1-2012

Language

English

Document Type

Dissertation

Degree Name

Doctor of Philosophy (PhD)

College/School/Department

Department of Nanoscale Science and Engineering

Program

Nanoscale Engineering

Content Description

1 online resource (xvi, 238 pages) : illustrations (some color)

Dissertation/Thesis Chair

John G Hartley

Committee Members

Timothy R Groves, Robert L Brainard, Kathleen A Dunn, Radislav A Potyrailo

Keywords

Electron Beam Lihography, Hansen Solubility Parameters, Nanostructures, Photonics, Resist, Lithography, Electron beam

Subject Categories

Materials Science and Engineering | Nanoscience and Nanotechnology | Polymer Chemistry

Abstract

Three dimensional micro- and nano-structures are commonly used in the field of Photonics, Optoelectronics, Sensors and Biological applications. Although numerous physical models are developed, a major challenge has been in their fabrication which is commonly limited to conventional layer-by-layer techniques. In this dissertation, a novel method for fabricating three dimensional structures using Electron Beam Lithography (EBL) will be presented.

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