Date of Award

1-1-2013

Language

English

Document Type

Master's Thesis

Degree Name

Master of Science (MS)

College/School/Department

Department of Nanoscale Science and Engineering

Program

Nanoscale Engineering

Content Description

1 electronic text (vii, 39 pages) : illustrations (some color)

Dissertation/Thesis Chair

Eric T Eisenbraun

Committee Members

Hassaram Bakhru, Alain Diebold, Ernest Levine, Jeffrey Warrender

Keywords

Silicides, Nickel, Photovoltaic cells, Silicon solar cells, Physical vapor deposition

Subject Categories

Nanoscience and Nanotechnology

Abstract

Metal silicides are used as contacts to the highly n-doped emitter in photovoltaic devices. Thin films of nickel silicide (NiSi) are of particular interest for Si-based solar cells, as they form at lower temperature and consume less silicon. However, interfacial oxide limits the reduction in sheet resistance. Hence, different diffusion barriers were investigated with regard to optimizing the conductivity and thermal stability.

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