Date of Award
1-1-2011
Language
English
Document Type
Master's Thesis
Degree Name
Master of Science (MS)
College/School/Department
Department of Nanoscale Science and Engineering
Program
Nanoscale Engineering
Content Description
1 online resource (xviii, 254 pages) : illustrations (some color)
Dissertation/Thesis Chair
Adam M Munder
Committee Members
Matt Malloy, Timothy Groves, Magnus Bergkvist, Michael Yakimov
Keywords
Fabrication, Imprint Lithography, Imprint Template, Lithography, Photomask, Process, Microlithography, Nanotechnology, Semiconductors, Lithography, Electron beam, Nanostructured materials
Subject Categories
Nanoscience and Nanotechnology
Abstract
The College of Nanoscale Science and Engineering (CNSE) is studying imprint template fabrication with the 100kV Vistec VB300 Gaussian E-Beam writer. The major goal is to develop and advance imprint template fabrication technology using low cost quartz wafers for proof-of-concept demonstrations.
Recommended Citation
Munder, Adam Marc, "Cost-effective imprint template fabrication for step and flash imprint lithography" (2011). Legacy Theses & Dissertations (2009 - 2024). 591.
https://scholarsarchive.library.albany.edu/legacy-etd/591